Technical Program - SPIE

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Technical Program www.spie.org/al

Location San Jose Marriott and San Jose Convention Center San Jose, California, USA

Conferences and Courses 24–28 February 2013 Exhibition 26–27 February 2013

Welcome Your attendance at SPIE Advanced Lithography increases your company’s success in the lithography industry through access to the latest research, networking opportunities, and technology on display. SPIE would like to express its deepest appreciation to the symposium chairs, conference chairs, program committees, and session chairs who have so generously given their time and advice to make this symposium possible.

Technical Program Conferences and Courses: 24–28 February 2013 · Exhibition: 26–27 February 2013 San Jose Marriott and San Jose Convention Center, San Jose, California, USA

The symposium, like our other conferences and activities, would not be possible without the dedicated contribution of our participants and members. This program is based on commitments received up to the time of publication and is subject to change without notice.

Contents

Technical Conferences

Welcome . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 2 Sponsors . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 3 Floor Plans . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 4 Daily Schedule . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 5   Events, Conferences Plenary Presentations . . . . . . . . . . . . . . . . . . . . . . . . . . . . 6–7 Special and Technical Events . . . . . . . . . . . . . . . . . . . . . . 6–8 Award Announcements . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9 Exhibition Information . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 10 General Information . . . . . . . . . . . . . . . . . . . . . . . . . . . . 11–14 Course Schedule . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 15 Technical Conference Session Schedule . . . . . . . . . . . 16–17 Index of Authors, Chairs, and Committee Members . . 54–65 Proceedings of SPIE . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 66

Extreme Ultraviolet (EUV) Lithography IV (Naulleau, Wood) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18-48 Alternative Lithographic Technologies V (Tong, Resnick) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18-52 Metrology, Inspection, and Process Control for Microlithography XXVII (Starikov, Cain) . . . . . . . . 18-52 Advances in Resist Materials and Processing Technology XXX (Somervell, Wallow) . . . . . . . . . . . . . 18-43 Optical Microlithography XXVI (Conley, Lai) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 19-53 Design for Manufacturability through Design-Process Integration VII (Mason, Sturtevant) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 19-53 Advanced Etch Technology for Nanopatterning II (Zhang, Oehrlein, Lin) . . . . . . . . . . . 19-31

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1

Welcome! Executive Committee Jason P. Cain, Advanced Micro Devices, Inc. Will Conley, Cymer, Inc. Mircea V. Dusa, ASML US, Inc. Kafai Lai, IBM Corp. Harry J. Levinson, GLOBALFOUNDRIES Inc. Mark E. Mason, Texas Instruments Inc. Patrick P. Naulleau, Lawrence Berkeley National Lab. Gottlieb Oehrlein, Univ. of Maryland, College Park Douglas J. Resnick, Molecular Imprints, Inc. Mark H. Somervell, Tokyo Electron America, Inc. Alexander Starikov, I&I Consulting John L. Sturtevant, Mentor Graphics Corp. William M. Tong, KLA-Tencor Corp Thomas I. Wallow, GLOBALFOUNDRIES Inc. Obert R. Wood II, GLOBALFOUNDRIES Inc. Ying Zhang, Taiwan Semiconductor Manufacturing Co., Ltd. Advisory Committee Robert D. Allen, IBM Almaden Research Ctr. William H. Arnold, ASML US, Inc. Timothy A. Brunner, IBM Thomas J. Watson Research Ctr. Ralph R.